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Photopolymers have led to groundbreaking achievements in the electronics, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, microelectromechanical systems (MEMS), and medical materials. Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, this book covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world's largest corporations.
Kenichiro Nakamura graduated from Kanazawa University, Japan in 1963 and from the University of Tokyo, Japan in 1968 with his doctorate in engineering. He conducted his postdoctoral fellowship at the University of Texas at Austin, USA in 1968-1970. His experience also includes working for Prof. Albert Noyes in photochemistry; holding the positions of associate professor (1970-1978), professor (1978-2010), and honorary professor (2010-present) at Tokai University, Japan; and serving as editor-in-chief of the Journal of Photopolymer Science and Technology (1998-present). In addition to books, his work has been published in many prestigious journals.
Introduction. Basic Idea of Photopolymerization. Chemically Amplified Resists. Process of Chemically Amplified Resists. Nanoimprinting. Industrial Applications of Photopolymers. References.
